일반기술

Plasma polymerisation process를 이용한 나노소재 코팅 기술

Low pressure weakly ionized plasmas are used for a wide range of technology applications, for example ion etching, ion assisted deposition and implantation, surface modification and plasma polymerization. In these processes one very important parameter is the ion energy and the ion flux at the substrate. Therefore, the control of the ion energy and ion flux during the process is very important for different applications.-This system is unique to operate as only VUV source as well as higher VUV energy flux can be possible due to inductively coupling therefore it can reduce the processing time and that reduce the operational cost.-Higher ion flux has advantage to decrees the process time therefore reduces the operating cost, low cost, easily portable system.- Have very good advantage in organic thin film deposition where the functional selectivity or higher retention of monomer functionalities is very important.